Generation of short-pulse VUV and XUV radiation

✍ Scribed by B. Wellegehausen; H. Welling; C. Momma; M. Feuerhake; K. Mossavi; H. Eichmann

• Publisher: Springer
• Year: 1996
• Tongue: English
• Weight: 751 KB
• Volume: 28
• Category: Article
• ISSN: 0306-8919
• DOI: 10.1007/bf00385858

✦ Synopsis

Starting from intense short-pulse KrF (248nm, 25m J, 400fs), ArF (193nm, 10m J, ,.~1 ps), and Ti:sapphire (810nm, 100m J, 150fs) laser systems, schemes for the generation of fixed-frequency and tunable VUV and XUV radiation by nonlinear optical techniques are investigated. With the KrF system, a four-wave mixing process in xenon yields tunable radiation in the range of 130-200nm with output energies of, so far, 100 #J in less than 1 ps. For the XUV spectral range below 100 nm, nonperturbative high-order harmonic generation and frequency mixing processes in noble gas jets are considered. To achieve tunability, the intense fixed-frequency pump laser radiation is mixed with less intense but broadly tunable radiation from short-pulse dye lasers or optical parametric generator-amplifier systems. In this way, tunability down to wavelengths of less than 40 nm has been demonstrated.