Generation of short-pulse VUV and XUV ra
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B. Wellegehausen; H. Welling; C. Momma; M. Feuerhake; K. Mossavi; H. Eichmann
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Article
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1996
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Springer
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English
β 751 KB
Starting from intense short-pulse KrF (248nm, 25m J, 400fs), ArF (193nm, 10m J, ,.~1 ps), and Ti:sapphire (810nm, 100m J, 150fs) laser systems, schemes for the generation of fixed-frequency and tunable VUV and XUV radiation by nonlinear optical techniques are investigated. With the KrF system, a fou