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General problems of high resolution lithography

โœ Scribed by Georgy M. Mladenov; Harald Seyfarth

Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
565 KB
Volume
36
Category
Article
ISSN
0042-207X

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A conventional TEWSTEM has been used for the fabrication of -10 nm-size structures by electron-beam lithography. The electron microscope provides a versatile tool for studying the lithographic process with control of the beam energy, current, and profile combined with the ability to image both the p