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Galvanomagnetic properties of p diffusion, accumulation and inversion layers at the SiSiO2 interface in the low temperature range

✍ Scribed by N.B. Velchev; V.N. Holiavko; B.V. Morozov; E.M. Skok

Publisher: Elsevier Science
Year: 1976
Tongue: English
Weight: 603 KB
Volume: 35
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(76)90197-8

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