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5191. Low-temperature annealing and hydrogenation of defects at the SiSiO2 interface: N M Johnson et al, J Vac Sci Technol, 19 (3), 1981, 390–394


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
145 KB
Volume
32
Category
Article
ISSN
0042-207X

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