Fundamental Gas Processes for the CVD Diamond Growth from H2/C2/H2/O2 and Ar/C2H2/O2 Mixtures
β Scribed by Benndorf, C. ;Schmidt, I. ;Joeris, P.
- Publisher
- John Wiley and Sons
- Year
- 1996
- Tongue
- English
- Weight
- 1012 KB
- Volume
- 154
- Category
- Article
- ISSN
- 0031-8965
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π SIMILAR VOLUMES
New high-level quantum chemical calculations have been undertaken to understand the rates and mechanisms of the reactive and associative channels for the reactants C2H2(+) + H2. The reactive channel, which produces C2H3(+) + H, has been shown to be slightly endothermic, confirming earlier calculatio
results of zb initio &culations for the two title reactions me reported. Temperature dependenrrs of cqniti& rium constants were obtained by a standard statistical-thermodynamic treatment for which all necessary molecular tortstants were generated by the ab initio SCF calculations of double zeta qual