Characterization of Long Phase Masks for
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François Ouellette; Peter A. Krug; Remco Pasman
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Article
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1996
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Elsevier Science
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English
⚖ 173 KB
We analyze the effects of periodic phase shifts due to stitching errors in phase masks made by electron beam lithography. Fiber gratings written with these masks show sidebands, the strength of which is used to determine the value of the phase shift.