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FTIR and electrical characterization of a-Si:H layers deposited by PECVD at different boron ratios

✍ Scribed by A. Orduña-Diaz; C.G. Treviño-Palacios; M. Rojas-Lopez; R. Delgado-Macuil; V.L. Gayou; A. Torres-Jacome

No coin nor oath required. For personal study only.

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