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FT-IR-ATR study of depth profile of SiO2 ultra-thin films

✍ Scribed by N. Nagai; H. Hashimoto

Book ID: 108416378
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 176 KB
Volume: 172
Category: Article
ISSN: 0169-4332
DOI: 10.1016/s0169-4332(00)00867-9

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