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FT-IR-ATR observation of SiOH and SiH in the oxide layer on an Si wafer

✍ Scribed by Nagasawa, Yoshikatsu ;Ishida, Hideyuki ;Soeda, Fusami ;Ishitani, Akira ;Yoshii, Ichiro ;Yamamoto, Kazuhiko

No coin nor oath required. For personal study only.

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