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FT-IR Analysis of Pyrone and Chromene Structures in Activated Carbon

✍ Scribed by Barroso-Bogeat, Adrián; Alexandre-Franco, María; Fernández-González, Carmen; Gómez-Serrano, Vicente


Book ID
124058957
Publisher
American Chemical Society
Year
2014
Tongue
English
Weight
297 KB
Volume
28
Category
Article
ISSN
0887-0624

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The evolution of the intrinsic stress with the annealing temperature in silicon oxide layers thermally grown and deposited by the low-pressure chemical vapour method has been analysed by the reflection-absorption Fourier transform infrared (FT-IR) technique. The results show that the annealing proce