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Free radical copolymerization in the presence of lewis acids. I. Alternating copolymerization of vinyl acetate with acrylic acid in the presence of GeCl4 and BCl3

✍ Scribed by Guo Jin Xu; Yue-Zhong Meng; Hong Song; Qing-Song Lin

Publisher
John Wiley and Sons
Year
1989
Tongue
English
Weight
442 KB
Volume
27
Category
Article
ISSN
0887-624X

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Free radical copolymerization behavior of vinyl acetate with butyl acrylate in the presence of GeCl4 and BCl3
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No alternating copolymers of vinyl acetate (VAc) and butyl acrylate (BA) were obtained by free radical copolymerization in the presence of GeCl 4 and (compared with the acrylic acidÈvinyl acetate copolymerization BCl 3 system). By ultraviolet spectral analysis, it was concluded that both and BCl 3 c

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Free radical copolymerization in the presence of lewis acids. II. Alternating copolymerization of styrene with butyl acrylate in the presence of SnCl4
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## Abstract The mechanism of alternating copolymerization of butyl acrylate (BA) with styrene (St) in the presence of SnCl~4~, photo‐initiated by Mn~2~(CO)~10~‐CCl~4~, has been investigated. The results show that the rate of copolymerization is proportional to [BA‐SnCl~4~] [St]^0^, which is in agre