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Free carrier absorption in heavily doped silicon layers

โœ Scribed by Isenberg, Joerg; Warta, Wilhelm


Book ID
120677662
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
279 KB
Volume
84
Category
Article
ISSN
0003-6951

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The activation behavior of the minority-carrier mobility and diffusivity in heavily doped (~102ยฐ cm -3) Si (Si:As) was investigated in the temperature range, 20 -350 K. Experimental results indicate that hole transitions between the valence band and localized shallow states give rise to the observed