Fracture toughness characterization of b
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L.S. Fan; R.T. Howe; R.S. Muller
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Article
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1990
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Elsevier Science
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English
β 743 KB
This paper describes the design and fabrication of a series of test structures for measuring the fracture toughness of brittle thin films, with application to low-pressure chemical-vapor-deposited (LPCVD) Si3N4 and low-stress, silicon-rich LPCVD SixNy. Crack-initiating features are patterned in clam