Fowler-nordheim emission and electron trapping in pure N2O/SiH4 PECVD oxide deposited on N2, H2 and O2 plasma precleaned Si wafers

✍ Scribed by H.N. Upadhyay; R.K. Chanana; R. Dwivedi; S.K. Srivastava

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 220 KB
• Volume: 37
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(94)90050-7