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Formation of vanadium silicide by high dose ion implantation

✍ Scribed by V.P. Salvi; A.M. Narsale; S.V. Vidwans; A.A. Rangwala; L. Guzman; M. Dapor; G. Giunta; L. Calliari; F. Marchetti

No coin nor oath required. For personal study only.

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