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Formation of SiH bonds on the surface of microcrystalline silicon covered with SiOx by HF treatment

✍ Scribed by H. Ubara; T. Imura; A. Hiraki

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

FT-IR characterization of SiH bonds on

✍ P. Quintard; G. Ramis; M. Cauchetier; G. Busca; V. Lorenzelli 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 289 KB