Formation of nanocrystalline silicon films using high-dose H+ion implantation into silicon-on-insulator layers with subsequent rapid thermal annealing

✍ Scribed by I. E. Tyschenko; V. P. Popov; A. B. Talochkin; A. K. Gutakovskii; K. S. Zhuravlev

• Book ID: 110137545
• Publisher: Springer
• Year: 2004
• Tongue: English
• Weight: 143 KB
• Volume: 38
• Category: Article
• ISSN: 1063-7826
• DOI: 10.1134/1.1641141