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Formation of high-quality oxide/nitride stacked layers on rugged polysilicon electrodes by rapid thermal oxidation

✍ Scribed by Itoh, S.; Lo, G.Q.; Kwong, D.L.; Mathews, V.K.; Fazan, P.C.

Book ID: 114535150
Publisher: IEEE
Year: 1993
Tongue: English
Weight: 331 KB
Volume: 40
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.214749

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