Formation of contacts to shallow junctions using titanium silicide with diffusion barriers

✍ Scribed by W Zagozdzon-Wosik; I Rusakova; S.R Gooty; D Marton; J Li; Z.H Zhang; C.-H Lin; R.J Bleiler; D.X Zhang

• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 292 KB
• Volume: 1
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/s1369-8001(98)00047-x