Influence of TiSi2 formation temperature
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A Sabbadini; F Cazzaniga; T Marangon
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Article
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2000
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Elsevier Science
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English
β 542 KB
This work is addressed to investigate thermal stability of a thin TiSi film, that is its ability to resist degradation due to 2 heat treatments at high temperatures. The study was carried out as a function of the formation RT treatment (675-7508C) at the end of a common process flow. Sheet resistanc