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Formation and gasification of carbon deposits on NiSiO2 catalysts

โœ Scribed by E.G.M. Kuijpers; J.W. Geus


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
563 KB
Volume
62
Category
Article
ISSN
0016-2361

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โœฆ Synopsis


The deposition of carbon from CH* and CO on Ni/SiOz catalysts was studied in pulse-flow experiments as well as volumetrically with a low-field magnetic permeameter. It was found that carbon, deposited from CH* according to: CH, -+ C + 4H, gave rise to the formation of nickel carbide, N&C, only at the surface of the nickel particles (T < 300ยฐC). However, carbon, deposited from CO according to: 2C0 -+ C + CO*, led to the formation of a bufk nickel carbide as well as dissolution of carbon interstitially. The reactivity of the carbon thus deposited was studied with both H, and H,O. The rate of reaction with hydrogen appeared to be a function of temperature: the rate passed through a maximum at 200ยฐC and dropped steeply above 300ยฐC. The only product of the reaction was CH,. The reaction with Hz0 produced besides CH,, CO, and (at low carbon surface coverages) HP.


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