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Formation and Characterization of Self-assembled Monolayers of Octadecyltrimethoxysilane on Chromium: Application in Low-Energy Electron Lithography

✍ Scribed by Hild, R.; David, C.; Müller, H. U.; Völkel, B.; Kayser, D. R.; Grunze, M.

No coin nor oath required. For personal study only.

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