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Forbidden lines from highly charged, metastable ion beams

✍ Scribed by Prior, M. H.


Book ID
115392683
Publisher
Optical Society of America
Year
1987
Tongue
English
Weight
528 KB
Volume
4
Category
Article
ISSN
0740-3224

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Ion beam lithography (IBL) is a very useful tool for the fabrication of nano-structures. In order to expand the applicability of IBL by using highly charged ions (HCI), Ar 1+ and Ar 9+ ions were irradiated onto spin-on-glass (SOG) through a stencil mask. The step structure was successfully fabricate