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DC beams of highly charged ions from the EBIS

✍ Scribed by R. Becker; M. Kleinod; H. Klein

Book ID
114168237
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
201 KB
Volume
24-25
Category
Article
ISSN
0168-583X

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Ion beam lithography (IBL) is a very useful tool for the fabrication of nano-structures. In order to expand the applicability of IBL by using highly charged ions (HCI), Ar 1+ and Ar 9+ ions were irradiated onto spin-on-glass (SOG) through a stencil mask. The step structure was successfully fabricate