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FMR, XRD and XHRTEM characterization of stresses in an epitaxial Ni–Cu film prepared on MgO(001) by d.c. biased plasma sputter deposition

✍ Scribed by Hiroko Maruyama; Hong Qiu; Mituri Hashimoto; Kazuyoshi Fudaba; Hisashi Nakai; Arpad Barna; Peter B Barna


Book ID
108389028
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
283 KB
Volume
299
Category
Article
ISSN
0040-6090

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