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Film deposition by transient plasma created by intense pulsed electron beam

✍ Scribed by XL Jiang; N Xu; LJ Han

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 109 KB
Volume: 42
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(91)91480-c

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