Fast coloration in sputtered gasochromic tungsten oxide films
β Scribed by Shanak, H. ;Schmitt, H.
- Book ID
- 105363831
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 299 KB
- Volume
- 203
- Category
- Article
- ISSN
- 0031-8965
No coin nor oath required. For personal study only.
β¦ Synopsis
Abstract
Thin films of WO~3~ were deposited with different thickness in a mixed atmosphere of O~2~ and Ar gas from a high purity target of 99.99% tungsten using reactive DCβsputtering technique. Same amount of the Pt catalyst was sputtered from a high purity target of 99.99% platinum in Ar atmosphere onto the top of the WO~3~ films with different thickness. Coloration takes place in hydrogen and bleaching in oxygen gases. During the coloration/bleaching process several optical parameters were determined. The velocity of coloration process increases with increasing the thickness of the films. The change of the transmission in the visible and near infrared regions was measured during coloration and bleaching process. (Β© 2006 WILEYβVCH Verlag GmbH & Co. KGaA, Weinheim)
π SIMILAR VOLUMES
## Abstract Tungsten oxide thin films were produced by reactive sputter deposition which is an advantageous method because of the opportunity to influence the properties of the films by several parameters. This work focuses on the influence of the oxygen content during the sputtering process and on
Recent infrared and Raman spectroscopic studies of various tungsten oxide films concluded either the formation of \(\mathrm{W}=\mathrm{O}\) terminal bonds or the transformation of such bonds into \(\mathrm{W}-\mathrm{OH}\) groups upon proton insertion. The infrared transmission and reflection spectr