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Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO2 thin films

✍ Scribed by Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato

Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
144 KB
Volume
4
Category
Article
ISSN
1369-8001

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ZIrconrum dloxlde thm films and yttna stablhsed zlrconla (YSZ) tbm films prepared by vanous techniques were charactensed by optical and electrochenucal techniques Zirconnun oxide films were prepared anodlcally (2-25Onm) and by sputtenng (0 3-3 pm) YSZ films were prepared by a CVD/EVD process (-3pm),