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Facile Preparation of Nanoelectrode Ensembles Using Amphiphilic Block Copolymer Film

✍ Scribed by Hirota, Kouske; Tajima, Keisuke; Hashimoto, Kazuhito


Book ID
126064302
Publisher
American Chemical Society
Year
2005
Tongue
English
Weight
352 KB
Volume
21
Category
Article
ISSN
0743-7463

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A topographic image of the PS-PFMA film after the scCO 2 process using 25 MPa saturated pressure. The original film thickness was 81 nm before the scCO 2 process. The full-scale height is 16 nm. The bar indicates 200 nm.