𝔖 Bobbio Scriptorium

✦ LIBER ✦

Fabrication process development for superconducting VLSI circuits: minimizing plasma charging damage

✍ Scribed by Tolpygo, S K; Amparo, D

Book ID: 121513024
Publisher: Institute of Physics
Year: 2008
Tongue: English
Weight: 487 KB
Volume: 97
Category: Article
ISSN: 1742-6588
DOI: 10.1088/1742-6596/97/1/012227

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[American Vacuum Soc 1999 4th Internatio

[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Antenna ratio definition for VLSI circuits [plasma etch damage]

✍ Simon, P.; Luchies, J.-M.; Maly, W. 📂 Article 📅 1999 🏛 American Vacuum Soc 🌐 English ⚖ 335 KB