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Fabrication of ultra-short T gates by a two-step electron beam lithography process

✍ Scribed by Yifang Chen; Kaiwu Peng; Zheng Cui

Book ID
113797651
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
252 KB
Volume
73-74
Category
Article
ISSN
0167-9317

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