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Fabrication of submicron gratings in fused silica by F2-laser ablation

✍ Scribed by J. Ihlemann; S. Müller; S. Puschmann; D. Schäfer; M. Wei; J. Li; P.R. Herman


Publisher
Springer
Year
2003
Tongue
English
Weight
135 KB
Volume
76
Category
Article
ISSN
1432-0630

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## Abstract A simple and cost‐effective method to manufacture a phase mask with high diffraction efficiency for deep UV application is proposed. The deep rectangular grating fabricated by using laser interference is etched directly into a fused silica substrate, instead of the dielectric coating on