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Fabrication of pure silica films for planar optical waveguides using colloidal suspensions

✍ Scribed by Deok-Yang Kim; Glen R. Kowach; David W. Johnson Jr.; Suhas Bhandarkar; Henry Du

Book ID
116667926
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
470 KB
Volume
342
Category
Article
ISSN
0022-3093

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UV photosensitivity of Ge-doped silica films deposited on Si (1 0 0) substrates using flame hydrolysis deposition (FHD) has been investigated. The ratio of Ge and Si of the sample was estimated by XPS as 10:90, and it was shown by AFM as smooth and homogeneous. It seems to have not germanium oxygen