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Ultraviolet photobleaching process of azo dye doped polymer and silica films for fabrication of nonlinear optical waveguides

โœ Scribed by Nakanishi, Makoto ;Sugihara, Okihiro ;Okamoto, Naomichi ;Hirota, Kazuo

Book ID
115346849
Publisher
The Optical Society
Year
1998
Tongue
English
Weight
601 KB
Volume
37
Category
Article
ISSN
1559-128X

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โœ Letian Zhang; Hanzhuang Zhang; Jian Wang; Jie Zheng; Wei Zheng; Yushu Zhang ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 170 KB

UV photosensitivity of Ge-doped silica films deposited on Si (1 0 0) substrates using flame hydrolysis deposition (FHD) has been investigated. The ratio of Ge and Si of the sample was estimated by XPS as 10:90, and it was shown by AFM as smooth and homogeneous. It seems to have not germanium oxygen