A topographic image of the PS-PFMA film after the scCO 2 process using 25 MPa saturated pressure. The original film thickness was 81 nm before the scCO 2 process. The full-scale height is 16 nm. The bar indicates 200 nm.
Fabrication of porous carbon micropillars using a block copolymer as porogen
β Scribed by Varun Penmatsa; Jung-Hoon Yang; Yan Yu; Chunlei Wang
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 901 KB
- Volume
- 48
- Category
- Article
- ISSN
- 0008-6223
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β¦ Synopsis
A technique to fabricate porous carbon micropillars using a block copolymer, F127, as porogen is described. In this process, negative tone photoresist (i.e. SU-8) mixed with F127 was photopatterned and carbonized under inert atmosphere. The thermal behavior of the photoresist precursor (F127 + SU-8) during carbonization process was characterized using differential scanning calorimetry and thermogravimetric analysis. Texture analysis on the carbon surface showed a mesoporous feature distribution. Electrochemical characterization based on the reaction of FeΓ°CNΓ 3Γ 6 =FeΓ°CNΓ 4Γ 6 redox couple was utilized to study the change in the effective surface area (A eff ) of the porous carbon electrodes with different weight percentages of F127 in SU-8. These results indicated that porous carbon thin film electrodes derived from 10% F127 mixed in SU-8 had an A eff 185% compared to the conventional photoresist derived carbon electrode. This fabrication approach can be employed to produce reproducible high aspect ratio carbon microelectrodes with different shapes for various electrochemical devices.
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