๐”– Bobbio Scriptorium
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Fabrication of nanometer-scale conducting silicon wires with a scanning tunneling microscope

โœ Scribed by P.M. Campbell; E.S. Snow; P.J. McMarr


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
919 KB
Volume
37
Category
Article
ISSN
0038-1101

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Nanometer size features have been etched in a circa 200 8, thick CdSe fti held in a scanning tunneling microscope (STM) by irradiation with a He-Ne laser (8 mW) with the STM tip biased to a positive potential. Etching does not occur in the absence of irradiation or with the STM tip biased negative.