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Fabrication of molecular-electronic circuits by nanoimprint lithography at low temperatures and pressures

โœ Scribed by G.Y. Jung; S. Ganapathiappan; X. Li; D.A.A. Ohlberg; D.L. Olynick; Y. Chen; W.M. Tong; R.S. Williams

Book ID
106019093
Publisher
Springer
Year
2004
Tongue
English
Weight
390 KB
Volume
78
Category
Article
ISSN
1432-0630

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โœ H.L. Chen; S.Y. Chuang; H.C. Cheng; C.H. Lin; T.C. Chu ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 191 KB

We demonstrated a new imprint method named nanoimprinting in metal/polymer bi-layer structures (NIMB) for patterning metal films with varied profiles. Converse with conventional nanoimprint lithography, the patterned mold is directly imprint in metal films not in polymer based resists. In general, d