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Fabrication of magnetic microstructures by using thick layer resists

✍ Scribed by B. Löchel; A. Maciossek; M. König; H.-L. Huber; G. Bauer


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
532 KB
Volume
21
Category
Article
ISSN
0167-9317

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FePt (50 nm) and [FePt (x nm)/ZrO 2 (0.5, 1, 2, 3 nm)] 10 (x = 2, 5 nm) films were prepared by RF magnetron sputtering technique, then were annealed at 550 • C for 30 min. This work investigates the effect of ZrO 2 layer thickness on structures and magnetic properties of FePt/ZrO 2 multilayers. The