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Fabrication of low-loss channel waveguides in Al2O3and Y2O3layers by inductively coupled plasma reactive ion etching

✍ Scribed by J.D.B. Bradley; F. Ay; K. Wörhoff; M. Pollnau


Publisher
Springer
Year
2007
Tongue
English
Weight
428 KB
Volume
89
Category
Article
ISSN
0721-7269

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