Fabrication of high quality silicon related films with band-gap of 1.5 eV by chemical annealing

✍ Scribed by W. Futako; K. Yoshino; K. Nakamura; C.M. Fortmann; I. Shimizu

• Book ID: 115542016
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 244 KB
• Volume: 198-200
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/0022-3093(96)00037-3