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Fabrication of CMOS retrograde wells by doping compensation with ion implantation

✍ Scribed by J Montserrat; J Bausells; E Lora-Tamayo; F Serra-Mestres

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
302 KB
Volume
39
Category
Article
ISSN
0042-207X

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