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Fabrication and characterization of low-loss optical waveguides using a novel photosensitive polyimide

✍ Scribed by Yurt, N.; Mune, K.; Naito, R.; Fukuoka, T.; Mochizuki, A.; Matsumoto, K.; Meredith, G.; Peyghambarian, N.; Jabbour, G.E.

Book ID
115371295
Publisher
Optical Society of America
Year
2005
Tongue
English
Weight
474 KB
Volume
23
Category
Article
ISSN
0733-8724

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UV photosensitivity of Ge-doped silica films deposited on Si (1 0 0) substrates using flame hydrolysis deposition (FHD) has been investigated. The ratio of Ge and Si of the sample was estimated by XPS as 10:90, and it was shown by AFM as smooth and homogeneous. It seems to have not germanium oxygen