𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Extremely thin silicon ΔE detectors for ion beam analysis

✍ Scribed by Harry J. Whitlow; Thomas Winzell; Göran Thungström


Book ID
114169803
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
630 KB
Volume
136-138
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Ion beam analysis of PECVD silicon oxide
✍ F. Fernandez-Lima; J.A. Rodriguez; E. Pedrero; H.D. Fonseca Filho; A. Llovera; M 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 202 KB

A study of ion beam analysis techniques of plasma enhanced chemical vapor deposited (PECVD) silicon oxide thin films (1 lm thick) obtained from silane (SiH 4 ) and nitrous oxide (N 2 O) is reported. The film, elemental composition and surface morphology were determined as function of the reactant ga

Application of ion beam analysis to the
✍ A. Vomiero; C. Scian; G. Della Mea; V. Guidi; G. Martinelli; G. Schiffrer; E. Co 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 125 KB

Ion beam analysis was successfully applied to a novel technique, named selective sublimation process (SSP), for deposition of nanostructured gas-sensing films through reactive sputtering. The method consists of the co-deposition of a mixed oxide, one of which has a relatively low sublimation tempera