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Extremely low surface recombination velocities on low-resistivity n -type and p -type crystalline silicon using dynamically deposited remote plasma silicon nitride films

✍ Scribed by Duttagupta, Shubham; Lin, Fen; Wilson, Marshall; Boreland, Matthew B.; Hoex, Bram; Aberle, Armin G.

Book ID
121278327
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
630 KB
Volume
22
Category
Article
ISSN
1062-7995

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