Exit surface dependence of the wavefunction measured and corrected by means of off-axis electron holography

✍ Scribed by Lehmann, Michael

• Book ID: 105363421
• Publisher: John Wiley and Sons
• Year: 2005
• Tongue: English
• Weight: 765 KB
• Volume: 202
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200521269

✦ Synopsis

Abstract

In high‐resolution transmission electron microscopy (HRTEM), the recorded image intensity of a crystal, oriented on a low‐index zone‐axis, strongly depends on aberrations, in particular on defocus. However, already slight deviations of the exit surface from the incident plane electron wave causes a strong position‐dependent defocus, which, in the past, has rarely been considered in the analysis of HRTEM micrographs. Using off‐axis electron holography, the complete electron wave is available in both real space and Fourier space so that the reconstructed electron wave can be back‐propagated to the corresponding exit plane. Based on the thorough analysis of amplitude and phase of partial waves stemming from single reflections, a novel correction procedure is outlined yielding the object exit‐wave directly at the exit surface of the object. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)