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Excimer laser photolysis of organometallic compounds for Zn deposition

✍ Scribed by E. Borsella; R. Larciprete


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
398 KB
Volume
36
Category
Article
ISSN
0169-4332

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The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for