Silicon consumption in excimer-laser-ass
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A.J.P. van Maaren; P.M. Zagwijn; W.C. Sinke
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Article
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1991
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Elsevier Science
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English
โ 947 KB
We have deposited tungsten on silicon from WF 6 and H 2 by laser-assisted chemical vapour deposition. An ArF excimer laser was aligned parallel to the substrate. The deposition experiments were performed to investigate reactions between WF 6 and the silicon substrate. We investigated the roughness a