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Evolution of the Al2O3/Ge(1 0 0) interface for reactively sputter-deposited films submitted to postdeposition anneals

✍ Scribed by Nicolau Molina Bom; Gabriel Vieira Soares; Cristiano Krug; Rafael Peretti Pezzi; Israel Jacob Rabin Baumvol; Claudio Radtke

Book ID: 116245119
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 756 KB
Volume: 258
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2012.02.066

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Evolution of the Al2O3/Ge(1&#xa0;0&#xa0;0) interface for reactively sputter-deposited films submitted to postdeposition anneals

Evolution of the Al2O3/Ge(1 0 0) interface for reactively sputter-deposited films submitted to postdeposition anneals