Evidence of change in crystallization behavior of thin HfO2 on Si: Effects of self-formed SiO2 capping layer

✍ Scribed by Shih, Chuan-Feng; Hsiao, Chu-Yun; Hsiao, Yu-Chih; Chen, Bo-Cun; Leu, Ching-Chich

• Book ID: 123033802
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 439 KB
• Volume: 556
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2014.01.023